This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Imec Vzw, Katholieke Universiteit Leuven. Active years: 2025.
Company Filing History:
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Years Active: 2025
Title: Alain Moussa: Innovator in Pattern Height Metrology
Introduction
Alain Moussa is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of metrology, particularly in the area of pattern height measurement using advanced technologies.
Latest Patents
One of his key patents is titled "Pattern height metrology using an e-beam system." This patent focuses on determining the height of patterns produced with extreme ultraviolet (EUV) lithography in a resist film. The method involves using a scanning electron microscope (SEM) to obtain images of the pattern. A processor is utilized to analyze the SEM image, determine a contrast value related to the pattern, and subsequently calculate the pattern height based on calibration data and the contrast value.
Career Highlights
Alain Moussa has worked with prestigious institutions such as Katholieke Universiteit Leuven and Imec Vzw. His work at these organizations has allowed him to develop innovative solutions in the field of metrology.
Collaborations
Some of his notable coworkers include Danilo De Simone and Mohamed Saib. Their collaboration has contributed to advancements in the technologies related to pattern height measurement.
Conclusion
Alain Moussa's work in pattern height metrology showcases his innovative spirit and dedication to advancing measurement technologies. His contributions are significant in the realm of EUV lithography and metrology.