This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Institut Systèmes Industriels, Haute Ecole De Suisse Occidentale, Valais-Wallis (Hes-So), Iprint Institute. Active years: 2026.
Company Filing History:
1 out of 1 
1 out of 1 Years Active: 2026
Title: Alain Germanier - Innovator in Plasma Technology
Introduction
Alain Germanier is an inventor based in Sion, Switzerland. He has made contributions to the field of plasma technology, although he currently holds no granted patents. Throughout his career, he has worked with several notable institutions, including the Institut Systèmes Industriels, Haute École De Suisse Occidentale, and the Iprint Institute. His collaborations with colleagues such as Fritz Bircher and Christoph Ellert have further enriched his professional journey.
Latest Patent Applications
Alain Germanier's most recent patent application is titled "Multicell or Multiarray Plasma and Method for Surface Treatment Using the Same." This application discloses a plasma device that includes at least two plasma cells and a command unit. The first and second electrodes of a given plasma cell are independent from the corresponding electrodes of contiguous plasma cells. The electrodes of these contiguous plasma cells are independently connected to the command unit, which features a high voltage generator and a radiofrequency generator, mutually protected by a filtering element.
Conclusion
Alain Germanier's work in plasma technology showcases his innovative spirit and dedication to advancing the field. His contributions, although not yet reflected in granted patents, highlight the potential for future developments in this area.