The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2026

Filed:

Aug. 20, 2021
Applicants:

Institut Systèmes Industriels, Haute Ecole DE Suisse Occidentale, Valais-wallis (Hes-so), Sion, CH;

Iprint Institute, Marly, CH;

Inventors:

Fritz Bircher, Madiswil, CH;

Christoph Ellert, Sion, CH;

Alain Germanier, Sion, CH;

David Martinet, Mollens, CH;

Gilbert Gugler, Marly, CH;

Sebastian Filliger, Naters, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32366 (2013.01); H01J 37/3244 (2013.01); H01J 37/32477 (2013.01); H01J 37/32568 (2013.01); H01J 2237/336 (2013.01);
Abstract

Disclosed is a plasma device including at least two plasma cells, and a command unit, wherein the first and the second electrodes of a given plasma cell are independent from the corresponding first and second electrodes of the contiguous plasma cells. The electrodes of contiguous plasma cells are independently connected to the command unit. The command unit includes a high voltage generator and a radiofrequency generator which are mutually protected by a filtering element.


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