Ootsu, Japan

Akira Tomita



Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 17(Granted Patents)


Location History:

  • Ohtsu, JP (1990)
  • Ootsu, JP (1994 - 1998)
  • Shiga, JP (1985 - 2010)

Company Filing History:


Years Active: 1985-2010

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6 patents (USPTO):Explore Patents

Title: **Akira Tomita: Innovator in Photosensitive Resin Technology**

Introduction

Akira Tomita, a prominent inventor based in Ootsu, Japan, has made significant contributions to the field of photosensitive resin technology. With a total of six patents to his name, Tomita's work has enhanced the capabilities and applications of photosensitive materials in various industries.

Latest Patents

Among his latest inventions, Tomita has developed a series of innovative products related to photosensitive resin compositions and their applications. His notable patents include:

1. **Photosensitive resin composition**, characterized by its formulation that allows for development with an aqueous developer. This composition includes hydrophobic polymers derived from multiple water dispersion latexes, a photopolymerizable compound, and a photopolymerization initiator. The result is a product assured of good image reproducibility and resistance to both aqueous and cosolvent inks.

2. **Photosensitive layer using the same**, which aims to simplify the process of developing photosensitive layers while ensuring high stability and performance.

3. **Photosensitive resin printing original plate**, designed to produce reproducible images while maintaining compatibility with aqueous processing agents.

4. **Anti-tack layer for photopolymer printing plate and composition**, disclosed for its ability to resist wrinkling and provide superior storage stability, which is essential for maintaining the quality of prints over time.

Career Highlights

Tomita is employed by Toyo Boseki Kabushiki Kaisha, a company recognized for its innovations in textile and material sciences. His work at this organization has been instrumental in developing new applications for photosensitive resins in the printing industry, thereby pushing the boundaries of what is possible with these materials.

Collaborations

Throughout his career, Tomita has collaborated with talented individuals in the field, including Masaru Nanpei and Toshihiko Kajima. These partnerships have fostered an environment of innovation and have led to the development of breakthroughs in photosensitive resin technology.

Conclusion

Akira Tomita's contributions to the field of photosensitive resins exemplify the intersection of creativity and technology. Through his innovative patents and collaborations, he continues to influence the industry, paving the way for future advancements and applications.

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