This inventor holds 1 USPTO granted patent. Top assignee: Jeol Ltd.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: Akira Tohyama: Innovator in Lithographic Pattern Inspection
Introduction
Akira Tohyama is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of lithography, particularly in the area of stitching pattern accuracy. His innovative methods have enhanced the precision of lithographic processes, which are crucial in various manufacturing applications.
Latest Patents
Tohyama holds a patent for a "Method of inspecting accuracy in stitching pattern elements." This method allows for the quick and accurate inspection of stitching accuracy at the boundaries of lithographic patterns. The process involves exposing numerous regions of the lithographic pattern one at a time. Inspected regions are scanned using a charged-particle beam to detect secondary electrons. The resulting signals are stored as inspected images in an image memory, along with positional data about the inspected regions. After all images are accepted, they are compared with a reference image by an image processing unit. This comparison enables the extraction of pattern elements corresponding to the reference image, allowing for the detection of deviations at field boundaries.
Career Highlights
Tohyama's career is marked by his dedication to advancing lithographic technology. His work at Jeol Ltd. has positioned him as a key player in the development of innovative inspection methods. His patent reflects his commitment to improving accuracy and efficiency in the lithographic process.
Collaborations
Throughout his career, Tohyama has collaborated with esteemed colleagues, including Manabu Saito and Setsuo Norioka. These collaborations have fostered an environment of innovation and have contributed to the success of their projects.
Conclusion
Akira Tohyama's contributions to lithographic pattern inspection demonstrate his expertise and commitment to innovation. His patented method significantly enhances the accuracy of stitching patterns, showcasing the importance of precision in manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile