Tokyo, Japan

Akira Soeda

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Soeda. Retrieved from https://idiyas.com/inventor/akira-soeda-qzaod2z3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Akira Soeda: Innovator in Interlayer Connection Substrate Technology

Introduction

Akira Soeda is a notable inventor based in Tokyo, Japan, recognized for his contributions to the field of electronics. He has developed innovative methods that enhance the manufacturing processes of multilayer substrates, which are crucial in modern electronic devices.

Latest Patents

Soeda holds a patent for a "Method of manufacturing an interlayer connection substrate." This invention involves forming electrodes connected to through-holes (TH pads) on multilayer substrates, enabling efficient electric conduction. The process includes creating solder bumps on these electrodes and utilizing a three-layered sheet with adhesive resin to bond the substrates together. This method significantly improves the reliability and performance of electronic components.

Career Highlights

Throughout his career, Akira Soeda has been associated with Hitachi, Ltd., a leading company in technology and electronics. His work has contributed to advancements in manufacturing techniques, particularly in the production of multilayer substrates used in various electronic applications.

Collaborations

Soeda has collaborated with notable colleagues, including Chiko Yorita and Shinichirou Tooya, who have played significant roles in his research and development efforts.

Conclusion

Akira Soeda's innovative work in the field of interlayer connection substrates exemplifies the importance of advancements in electronic manufacturing. His contributions continue to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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