Akira Shibue

Title: Akira Shibue: Innovator in Dielectric Devices

Introduction

Akira Shibue is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of dielectric devices, holding a total of 9 patents. His innovative work focuses on enhancing the performance and reliability of electronic components.

Latest Patents

One of Shibue's latest patents is for a dielectric device and method of manufacturing it. This device features a substrate made of metal with an oxide dielectric layer mounted on its surface. The substrate's surface has metal oxide regions distributed like islands, which improve adhesion between the substrate and the oxide dielectric layer. This design prevents the formation of a rough surface, thereby maintaining optimal leakage characteristics.

Another notable patent is for a thin-film capacitor and electronic circuit board. This capacitor boasts a high insulation resistance value and reliability. It includes a dielectric thin film made from a perovskite-type composite oxide, which enhances its performance. The specific composition of the dielectric thin film is carefully controlled to ensure optimal functionality.

Career Highlights

Akira Shibue is currently employed at TDK Corporation, where he continues to innovate in the field of electronic components. His work has been instrumental in advancing technologies that rely on dielectric materials.

Collaborations

Shibue collaborates with talented coworkers, including Kenryo Namba and Kenji Horino. Their combined expertise contributes to the development of cutting-edge technologies in the industry.

Conclusion

Akira Shibue's contributions to dielectric devices and thin-film capacitors highlight his role as a leading inventor in the field. His innovative patents and collaborations continue to shape the future of electronic components.