Hiroshima, Japan

Akira Orihashi

This inventor holds 1 USPTO granted patent. Top assignee: Satake Corporation. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Orihashi. Retrieved from https://idiyas.com/inventor/akira-orihashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2002

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Akira Orihashi: Innovator in Sifting Technology

Introduction

Akira Orihashi is a notable inventor based in Hiroshima, Japan. He has made significant contributions to the field of sifting technology, particularly through his innovative methods that enhance operational efficiency and worker safety.

Latest Patents

Orihashi holds a patent for a "Method and apparatus for exchanging sifter frames of a plan sifter." This invention provides a systematic approach for exchanging multiple sifter frames within a sifting chamber. The method involves removing several sifter frames in a unitary state, thereby minimizing heavy labor and reducing risks for workers. The design allows for easy accommodation of new sifter frames, streamlining the entire process.

Career Highlights

Orihashi is associated with Satake Corporation, a leading company in the field of food processing and agricultural machinery. His work has been instrumental in advancing the technology used in sifting operations, making them safer and more efficient.

Collaborations

Orihashi has collaborated with notable colleagues such as Satoru Satake and Hideki Sakaki. Their combined expertise has contributed to the development of innovative solutions in the industry.

Conclusion

Akira Orihashi's contributions to sifting technology exemplify the impact of innovation in enhancing operational processes. His patent reflects a commitment to improving worker safety and efficiency in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…