This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1988.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1988
Title: Akira Kobana: Innovator in Flaw Measurement Technology
Introduction: Akira Kobana is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of flaw measurement technology, particularly through his innovative patent that utilizes eddy currents. His work has implications for various industries where the integrity of materials is crucial.
Latest Patents: Akira Kobana holds a patent for "Flaw size measurement equipment using eddy currents." This equipment is designed to measure flaws in an object by employing eddy currents. The technology focuses on the relationship between the amplitude of the signal detected during the scanning process and the position of the eddy current probe. The size of the flaw is determined based on the scan distance of the probe, which varies depending on the depth of penetration of the eddy current.
Career Highlights: Throughout his career, Akira Kobana has been associated with Hitachi, Ltd., where he has worked on various projects related to measurement technologies. His expertise in eddy current applications has positioned him as a key figure in advancing flaw detection methods.
Collaborations: Akira has collaborated with notable colleagues, including Sakae Sugiyama and Makoto Senoh, who have contributed to his research and development efforts. Their teamwork has fostered innovation and enhanced the effectiveness of the technologies they work on.
Conclusion: Akira Kobana's contributions to flaw measurement technology through his patent demonstrate his commitment to innovation in the field. His work continues to influence the industry, ensuring the reliability and safety of materials used in various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
