Akira Horikoshi

Title: Akira Horikoshi: Innovator in Substrate Processing Technologies

Introduction

Akira Horikoshi is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 3 patents. His innovative approaches have advanced the efficiency of substrate processing methods, particularly in the semiconductor industry.

Latest Patents

Horikoshi's latest patents include a substrate processing method and apparatus that utilize a liquid film of a processing liquid. This processing liquid contains components such as sulfuric acid and hydrogen peroxide. By radiating plasma to the liquid film, his methods enable efficient substrate processing through the oxidizing power of the processing liquid. Another notable patent describes a substrate processing method that involves supplying a processing solution onto the substrate's upper surface and executing plasma processing under atmospheric pressure. This method allows for the efficient removal of resists on the substrate's surface.

Career Highlights

Akira Horikoshi is currently employed at Screen Holdings Co., Ltd., where he continues to develop innovative technologies in substrate processing. His work has been instrumental in enhancing the capabilities of processing methods used in various applications.

Collaborations

Horikoshi collaborates with talented individuals in his field, including Shigeru Takatsuji and Shohei Nakamura. Their combined expertise contributes to the advancement of substrate processing technologies.

Conclusion

Akira Horikoshi's contributions to substrate processing have established him as a key figure in the industry. His innovative patents and collaborative efforts continue to drive advancements in this critical area of technology.