Akira Hisano

Title: Akira Hisano: Innovator in Sintered Compact Magnesium Oxide Targets

Introduction

Akira Hisano is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of magnesium oxide targets for sputtering applications. His innovative work has led to the filing of 8 patents that address critical challenges in the deposition quality of magnesium oxide films.

Latest Patents

Hisano's latest patents include a sintered compact magnesium oxide target for sputtering, which boasts a purity of 99.99 wt % or higher, excluding carbon, and a density of 3.57 g/cm³ or higher. This invention aims to provide a target that can uniformly deposit magnesium oxide films, meeting the increasing demand for higher purity and density in sputtering targets. His work addresses the issue of color shading that occurs during the production of these targets, which has been a concern in improving deposition quality.

Career Highlights

Throughout his career, Akira Hisano has worked with prominent companies such as JX Nippon Mining & Metals Corporation and Nippon Mining & Metals Co., Ltd. His experience in these organizations has allowed him to refine his expertise in materials engineering and patent development.

Collaborations

Hisano has collaborated with notable colleagues, including Yuichiro Nakamura and Yuichiro Shindo. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Akira Hisano's contributions to the field of magnesium oxide targets for sputtering highlight his innovative spirit and dedication to improving material quality. His patents reflect a commitment to addressing industry challenges and advancing technology in this specialized area.