Yokkaichi, Japan

Akira Hamaguchi

This inventor holds 1 USPTO granted patent. Top assignee: Kioxia Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Hamaguchi. Retrieved from https://idiyas.com/inventor/akira-hamaguchi-j51fo509

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Akira Hamaguchi: Innovator in Measurement Technology

Introduction

Akira Hamaguchi is a notable inventor based in Yokkaichi, Japan. He has made significant contributions to the field of measurement technology, particularly through his innovative patent that enhances the accuracy of three-dimensional shape estimation.

Latest Patents

Hamaguchi holds a patent for a measurement device, measurement system, and measurement method. This device includes an X-ray irradiation section, an X-ray detection section that detects scattered X-rays from an object, and an analysis section that analyzes diffraction images obtained through photoelectric conversion of the scattered X-rays. The analysis section estimates the three-dimensional shape of the object based on the diffraction images acquired while changing the irradiation angle of the X-rays. The shape data utilized includes critical measurements such as film thickness, neck diameter, and bottom diameter.

Career Highlights

Hamaguchi is currently employed at Kioxia Corporation, where he continues to develop innovative technologies in measurement systems. His work has been instrumental in advancing the capabilities of measurement devices, making them more efficient and accurate.

Collaborations

Hamaguchi collaborates with talented coworkers, including Yuki Abe and Takaki Hashimoto, who contribute to the innovative environment at Kioxia Corporation.

Conclusion

Akira Hamaguchi's contributions to measurement technology through his patent demonstrate his commitment to innovation and excellence in his field. His work continues to influence advancements in measurement systems, showcasing the importance of collaboration and creativity in technological development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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