Toyama, Japan

Akira Fukui



Average Co-Inventor Count = 1.5

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2010-2012

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2 patents (USPTO):Explore Patents

Title: Akira Fukui: Innovator in Semiconductor Technology

Introduction

Akira Fukui is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Fukui's work focuses on enhancing the efficiency and performance of semiconductor devices.

Latest Patents

Fukui's latest patents include a heat sink substrate and a member for semiconductor devices. The heat sink substrate features a composite structure with a three-dimensional network of SiC ceramic, which has pores infiltrated with Si. This design allows for a thermal conductivity of not less than 150 W/m·K and an oxygen content of not greater than 7 ppm. The substrate's increased surface area and superior thermal conductivity make it highly efficient for heat conduction from semiconductor devices.

The second patent, a member for semiconductor devices, is designed to be low-cost while providing a high-quality plating layer. It boasts a heat conductivity of over 180 W/m·K at high temperatures and is engineered to withstand mechanical stress without breaking. The base material is an aluminum-silicon carbide composite, ensuring durability and performance in various applications.

Career Highlights

Fukui is currently employed at A.L.M.T. Corporation, where he continues to develop innovative solutions in semiconductor technology. His work has positioned him as a key figure in the industry, contributing to advancements that enhance device performance and reliability.

Collaborations

Fukui collaborates with talented individuals such as Masahiro Omachi and Toshiya Ikeda, who contribute to his projects and innovations. Their combined expertise fosters a creative environment that drives technological advancements.

Conclusion

Akira Fukui's contributions to semiconductor technology through his patents demonstrate his commitment to innovation and excellence. His work not only enhances the performance of semiconductor devices but also paves the way for future advancements in the field.

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