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For the Inventor, By the Inventor

Yamanashi, Japan

Akinori Ohyama

This inventor holds 8 USPTO granted patents. Top assignee: Fanuc Corporation. Active years: 2005-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akinori Ohyama. Retrieved from https://idiyas.com/inventor/akinori-ohyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 8

% Patents Active = 62.5

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 66(Granted Patents)


Location History:

  • Minamitsuru-gun, JP (2015)
  • Yamanashi, JP (2005 - 2020)

Company Filing History:

goldMedal8 out of 6,292 
 
Fanuc Corporation
 patents

Years Active: 2005-2020

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8 patents (USPTO):Explore Patents
1. 10730148 - Laser processing device capable of reducing intensity of reflected laser beam (2020-08-04),
2. 10664767 - Machine learning apparatus, laser machining system and machine learning method (2020-05-26),
3. 10643127 - Machine learning apparatus for learning condition for starting laser machining, laser apparatus, and machine learning method (2020-05-05),
4. 10456869 - Laser processing device having preprocessing controller and laser processing method (2019-10-29),
5. 9541917 - Processing information acquisition system in processing machine supplying processing point with energy or material (2017-01-10),
6. 9535417 - Processing information acquisition system in processing machine supplying processing point with energy or material (2017-01-03),
7. 9104194 - Processing information acquisition system in processing machine supplying processing point with energy or material (2015-08-11),
8. 6934309 - Two-dimensional laser diode array light-emitting device (2005-08-23),

Title: Akinori Ohyama: Innovator in Laser Processing Technology

Introduction

Akinori Ohyama is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of laser processing technology, holding a total of 8 patents. His innovative work focuses on enhancing the efficiency and safety of laser machining systems.

Latest Patents

One of Ohyama's latest patents is a laser processing device capable of reducing the intensity of a reflected laser beam. This device is designed to avoid malfunctions caused by reflected beams while maintaining continuous laser oscillation. The system includes a controller that manages various components, such as a laser processing commanding part, a memory for storing monitored intensity, and a pre-processing commanding part. This invention aims to improve the reliability of laser processing operations.

Another notable patent is a machine learning apparatus that learns laser machining condition data. This apparatus observes the state of the laser machining system and acquires the results of the machining process. It utilizes a learning unit to associate the observed state with the machining results, ultimately outputting optimized laser machining condition data. This innovation represents a significant advancement in the integration of machine learning with laser technology.

Career Highlights

Akinori Ohyama is currently employed at Fanuc Corporation, a leading company in automation and robotics. His work at Fanuc has allowed him to collaborate with other talented engineers and researchers in the field. His contributions have not only advanced the company's technology but have also set new standards in laser processing.

Collaborations

Ohyama has worked alongside notable colleagues such as Atsushi Mori and Hiroshi Takigawa. Their combined expertise has fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Akinori Ohyama's work in laser processing technology exemplifies the spirit of innovation. His patents and contributions to Fanuc Corporation highlight his commitment to advancing the field. Through his efforts, he continues to shape the future of laser machining systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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