Location History:
- Osaka, JP (2015 - 2017)
- Sakai, JP (2018)
Company Filing History:
Years Active: 2015-2018
Title: Akiko Iwata: Innovator in Photosensitive Resin Technology
Introduction
Akiko Iwata is a prominent inventor based in Osaka, Japan. She has made significant contributions to the field of photosensitive resin technology, holding a total of 4 patents. Her work focuses on developing advanced materials for various electronic devices.
Latest Patents
Among her latest patents, Iwata has developed a photosensitive resin composition that includes a positive photosensitive resin with a photosensitive moiety that cleaves upon exposure to light. This innovative composition also incorporates a wavelength conversion material dispersed within the resin. Additionally, she has created a method for manufacturing light-emitting substrates, which includes a light-emitting layer on a substrate featuring red and green conversion layers, as well as a light scattering layer. This technology is crucial for applications in light-emitting devices, photovoltaic cells, and display devices.
Career Highlights
Iwata is currently employed at Sharp Kabushiki Kaisha Corporation, where she continues to push the boundaries of innovation in her field. Her work has garnered attention for its potential applications in various electronic and lighting devices.
Collaborations
She has collaborated with notable colleagues, including Mitsuhiro Koden and Yuhki Kobayashi, to further enhance her research and development efforts.
Conclusion
Akiko Iwata's contributions to photosensitive resin technology exemplify her dedication to innovation and advancement in the field. Her patents reflect her expertise and commitment to developing cutting-edge solutions for modern technology.