This inventor holds 1 USPTO granted patent. Top assignee: Canon Anelva Corporation. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Akihiro Sawada: Innovator in Plasma Treatment Technology
Introduction
Akihiro Sawada is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of plasma treatment technology, particularly through his innovative designs and patents. His work focuses on enhancing the uniformity of substrate treatment, which is crucial in various industrial applications.
Latest Patents
One of Akihiro Sawada's key patents is the Plasma Treatment Apparatus. This apparatus is designed to provide uniform substrate treatment by correcting unevenness in plasma density distribution. The configuration includes an evacuated container with an annular antenna surrounding its outer periphery. The apparatus consists of a power supply container and a process container where the substrate is placed. Plasma is generated in the power supply container through radio-frequency power supplied to the antenna. Additionally, the plasma is diffused into the process container by a magnetic field created by solenoid coils arranged around the antenna's outer periphery. The inclination of the magnetic field can be adjusted using an inclination adjustment mechanism, allowing for precise control over the treatment process.
Career Highlights
Akihiro Sawada is currently employed at Canon Aneiva Corporation, where he continues to develop and refine his innovative technologies. His work has been instrumental in advancing the capabilities of plasma treatment systems, making them more efficient and effective for various applications.
Collaborations
Throughout his career, Akihiro has collaborated with several talented individuals, including Masayoshi Ikeda and Kiyotaka Sakamoto. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Akihiro Sawada's contributions to plasma treatment technology exemplify the impact of innovative thinking in industrial applications. His patent for the Plasma Treatment Apparatus showcases his commitment to improving substrate treatment processes. Through his work at Canon Aneiva Corporation and collaborations with esteemed colleagues, Sawada continues to push the boundaries of technology in his field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile