The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2017
Filed:
Jun. 15, 2012
Masayoshi Ikeda, Hachioji, JP;
Kiyotaka Sakamoto, Tama, JP;
Akihiro Sawada, Kawasaki, JP;
Yasumi Sago, Tachikawa, JP;
Masami Hasegawa, Tama, JP;
Motozo Kurita, Fuchu, JP;
Masayoshi Ikeda, Hachioji, JP;
Kiyotaka Sakamoto, Tama, JP;
Akihiro Sawada, Kawasaki, JP;
Yasumi Sago, Tachikawa, JP;
Masami Hasegawa, Tama, JP;
Motozo Kurita, Fuchu, JP;
Canon Aneiva Corporation, Kawasaki-shi, JP;
Abstract
Provided is a plasma treatment apparatus capable of uniform substrate treatment by correction of unevenness in a plasma density distribution. The apparatus has a configuration such that a substrate is treated with plasma, and an evacuated container is provided with an annular antenna arranged around an outer periphery of the container, and is formed of a power supply container, and a process container where the substrate is placed, which communicates with an internal space of the power supply container. The plasma is generated in the power supply container by radio-frequency power supplied to the antenna. The plasma is diffused into the process container by a magnetic field of solenoid coils arranged around an outer periphery of the antenna. The inclination of the magnetic field is adjusted by an inclination adjustment means for adjusting the inclination of the solenoid coils with respect to the process substrate.