Company Filing History:
Years Active: 2017
Title: **The Innovative Contributions of Motozo Kurita**
Introduction
Motozo Kurita is a prominent inventor based in Fuchu, Japan, known for his significant contributions to the field of plasma treatment technology. His inventive work has resulted in a patent that enhances the uniformity of substrate treatment, showcasing the importance of innovation in industrial applications.
Latest Patents
Kurita holds a notable patent for a plasma treatment apparatus. This innovative device is designed to facilitate uniform substrate treatment by correcting discrepancies in plasma density distribution. The apparatus features an arrangement where a substrate is treated with plasma in an evacuated container, equipped with an annular antenna surrounding the outer periphery. The configuration includes a power supply container and a process container that effectively communicates for optimal plasma treatment. By utilizing radio-frequency power supplied to the antenna, plasma generation occurs, which is then diffused into the process container using a magnetic field created by solenoid coils positioned around the antenna's perimeter. The ability to adjust the magnetic field’s inclination via an inclination adjustment mechanism further enhances the system's effectiveness.
Career Highlights
Kurita is employed at Canon Aneiva Corporation, where he continues to develop and refine innovative technologies. His work not only reflects his commitment to excellence but also his ability to contribute to cutting-edge advancements in the field of plasma technology.
Collaborations
Throughout his career, Kurita has worked alongside esteemed colleagues, including Masayoshi Ikeda and Kiyotaka Sakamoto. Their collaborations have fostered an environment of creativity and innovation, further propelling advancements in the industry.
Conclusion
Motozo Kurita's inventions and patents illustrate the crucial role inventors play in technological advancement. His plasma treatment apparatus stands as a testament to the impact of innovation in achieving uniformity in substrate treatment processes. As he continues to work at Canon Aneiva Corporation, his contributions will undoubtedly influence the future of plasma technology and its applications.