Masami Hasegawa

Title: Masami Hasegawa: Innovator in Plasma Treatment Technology

Introduction

Masami Hasegawa is a prominent inventor based in Tama, Japan. She has made significant contributions to the field of plasma treatment technology. Her innovative work has led to the development of a unique apparatus that enhances substrate treatment processes.

Latest Patents

Hasegawa holds a patent for a plasma treatment apparatus. This apparatus is designed to provide uniform substrate treatment by correcting unevenness in plasma density distribution. The configuration includes an evacuated container with an annular antenna surrounding its outer periphery. The apparatus consists of a power supply container and a process container where the substrate is placed. Plasma is generated in the power supply container through radio-frequency power supplied to the antenna. The plasma is then diffused into the process container by a magnetic field created by solenoid coils arranged around the antenna's outer periphery. The inclination of the magnetic field can be adjusted using an inclination adjustment mechanism.

Career Highlights

Hasegawa is currently employed at Canon Aneiva Corporation, where she continues to innovate in her field. Her work has been instrumental in advancing plasma treatment technologies, which are crucial for various applications in manufacturing and materials science.

Collaborations

Throughout her career, Hasegawa has collaborated with notable colleagues, including Masayoshi Ikeda and Kiyotaka Sakamoto. These collaborations have further enriched her research and development efforts.

Conclusion

Masami Hasegawa's contributions to plasma treatment technology exemplify her dedication to innovation. Her patented apparatus represents a significant advancement in the field, showcasing her expertise and commitment to improving substrate treatment processes.