Location History:
- US (1995)
- Omiya, JP (1995 - 1996)
Company Filing History:
Years Active: 1995-1996
Title: Akihiro Nakamura: Innovator in Silica and Disinfectant Technologies
Introduction
Akihiro Nakamura is a notable inventor based in Omiya, Japan. He has made significant contributions to the fields of silica powder and disinfectant technologies. With a total of 3 patents, his work has garnered attention for its innovative approaches and practical applications.
Latest Patents
Nakamura's latest patents include a hydrophobic silica powder and a novel disinfectant method. The hydrophobic silica powder is treated with an amino-substituted silane compound and an organopolysiloxane. This powder exhibits a triboelectrification amount relative to iron ranging from over +100 µC/g to up to +700 µC/g, with a hydrophobing ratio of at least 60% as measured by the transmittance method. His disinfectant method involves a compound known as 1,n-bis(N^5 -m-, or p-trifluoromethyl-phenyl-N^1 -biguanido)-C3 -C10 -alkane. This compound demonstrates a germicidal effect against various microorganisms, including Pseudomonas aeruginosa and Proteus vulgaris, at concentrations significantly lower than those required for chlorhexidine.
Career Highlights
Throughout his career, Nakamura has worked with prominent companies such as Mitsubishi Materials Corporation and Yoshida Pharmaceutical Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas, leading to the successful patenting of his inventions.
Collaborations
Nakamura has collaborated with notable individuals in his field, including Akira Nishihara and Tsunetoshi Honda. These partnerships have contributed to the advancement of his research and the successful implementation of his inventions.
Conclusion
Akihiro Nakamura's contributions to silica and disinfectant technologies highlight his innovative spirit and dedication to improving public health. His patents reflect a commitment to developing effective solutions for various challenges in these fields.