Tokyo, Japan

Akihiro Mochida

This inventor holds 1 USPTO granted patent. Top assignee: Ebara Corporation. Active years: 2016.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Akihiro Mochida: Innovator in Polishing Technology

Introduction

Akihiro Mochida is a prominent inventor based in Tokyo, Japan. He is known for his innovative contributions to polishing technology, particularly in the development of a polishing apparatus designed to enhance the quality of substrate surfaces.

Latest Patents

Mochida holds a patent for a polishing apparatus that significantly reduces scratches generated on a substrate's surface during the polishing process. This invention involves a sophisticated mechanism that detects foreign matter, such as fragments of the substrate, on the inner circumferential surface of a retaining ring. The apparatus features a polishing table with a polishing surface and a top ring that holds the substrate while pressing it against the polishing surface. An imaging device is integrated to capture images of the retaining ring's inner surface, and an image processor analyzes these images to identify any foreign matter present.

Career Highlights

Mochida is associated with Ebara Corporation, a leading company in the field of precision equipment and technology. His work at Ebara has allowed him to focus on advancing polishing techniques that are crucial for various applications in semiconductor manufacturing and other industries.

Collaborations

Throughout his career, Mochida has collaborated with notable colleagues, including Ryuichi Kosuge and Hiroshi Sotozaki. These collaborations have contributed to the development of innovative solutions in the field of polishing technology.

Conclusion

Akihiro Mochida's contributions to polishing technology through his patented inventions demonstrate his commitment to innovation and excellence. His work continues to impact the industry positively, paving the way for advancements in substrate processing.

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