Akihiro Kuribayashi

Title: Akihiro Kuribayashi: Innovator in Film Deposition Technology

Introduction

Akihiro Kuribayashi is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of film deposition technology, holding a total of 6 patents. His innovative approaches have advanced the efficiency and effectiveness of cleaning methods in processing chambers.

Latest Patents

Kuribayashi's latest patents include a cleaning method and a film deposition apparatus. The cleaning method involves a sophisticated process for cleaning the interior of a processing chamber in a film deposition apparatus. This apparatus features a rotary table with multiple mounting areas. The method consists of discharging a carrier gas and a cleaning gas while rotating the rotary table, with the flow rate of the carrier gas being adjusted at different stages. This process is repeated a predetermined number of times, corresponding to the number of mounting areas on the rotary table. Another patent focuses on a method of cleaning a deposition apparatus using a cleaning gas formed into plasma, which includes a fluorine-containing gas and oxygen gas to clean the interior of a processing vessel where a silicon nitride film is deposited.

Career Highlights

Kuribayashi is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in developing advanced technologies that enhance the performance of film deposition processes.

Collaborations

Some of his notable coworkers include Noriaki Fukiage and Jun Ogawa, who have collaborated with him on various projects within the company.

Conclusion

Akihiro Kuribayashi's contributions to film deposition technology through his innovative patents have significantly impacted the industry. His work continues to inspire advancements in semiconductor manufacturing processes.