Akihiro Kitabatake

Title: Akihiro Kitabatake: Innovator in Thin Film Technology

Introduction

Akihiro Kitabatake is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of thin film technology, holding a total of 4 patents. His innovative approaches have advanced the methods used in film formation, showcasing his expertise and dedication to the field.

Latest Patents

Kitabatake's latest patents focus on the process of making thin films. One of his notable inventions is a film-forming apparatus that includes a gas introduction tube for introducing an inert gas into a vacuum chamber, a vapor source, and a target. This apparatus forms a thin film by depositing sputtered particles and evaporated particles on the surface of a substrate. The sputtered particles are liberated by sputtering the target using ion energy of plasma generated around the target, while the evaporated particles are obtained by evaporating a vapor source through heating and ionizing evaporated components using the plasma. The apparatus is designed with a substrate holder, a rotating table, and a shield fitted with a hollow space, enhancing the efficiency of the film-forming method.

Career Highlights

Throughout his career, Akihiro Kitabatake has worked with notable companies such as Sanyo Vacuum Industries Co. Ltd. and Sharp Corporation. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in thin film technology.

Collaborations

Some of his coworkers include Keiji Yamada and Shunsei Fukuchi, who have collaborated with him on various projects, further enriching his professional journey.

Conclusion

Akihiro Kitabatake's contributions to thin film technology through his patents and career achievements highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future innovations in film formation.