Company Filing History:
Years Active: 2007-2009
Title: Akihiko Tashiro: Innovator in Metal Film Technology
Introduction
Akihiko Tashiro is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of metal film technology, holding a total of 5 patents. His innovative approaches have advanced the methods used in forming metal films, which are crucial in various applications.
Latest Patents
One of Tashiro's latest patents is a method and apparatus for forming a metal film. This invention allows for the continuous formation of a metal film with varying qualities in thickness, utilizing a single processing solution. The method involves providing a substrate with embedded interconnects and forming a metal film on the surfaces of these interconnects by adjusting the flow state of the processing solution. Another notable patent is a substrate processing method that enables the measurement and monitoring of film thickness and properties during processing. This innovation allows for quick corrections in process conditions, ensuring a stable product of consistent quality.
Career Highlights
Tashiro is currently employed at Ebara Corporation, where he continues to develop and refine his technologies. His work has been instrumental in enhancing the efficiency and quality of metal film production processes.
Collaborations
Throughout his career, Tashiro has collaborated with notable colleagues, including Xinming Wang and Daisuke Takagi. These partnerships have fostered a collaborative environment that promotes innovation and the sharing of ideas.
Conclusion
Akihiko Tashiro's contributions to metal film technology exemplify the impact of innovative thinking in engineering. His patents and ongoing work at Ebara Corporation highlight his commitment to advancing the field.