Akifumi Ooshima

Title: Akifumi Ooshima: Innovator in Polysilicon Technology

Introduction

Akifumi Ooshima is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of polysilicon technology, holding 2 patents that focus on evaluating and inspecting polysilicon films. His work is essential for advancements in semiconductor manufacturing and related technologies.

Latest Patents

Ooshima's latest patents include a polysilicon evaluating method and a polysilicon inspection apparatus. The polysilicon evaluating method involves assessing the state of a polysilicon film formed by excimer laser annealing an amorphous silicon film. This method utilizes the linearity or periodicity in the spatial structure of the film surface, which is processed as an image and represented numerically. The polysilicon inspection apparatus enables objective automatic evaluation of the polysilicon film's status with high accuracy in a contact-free manner. It includes an optical system for observation with visible and UV light, allowing for detailed analysis of the film's surface.

Career Highlights

Throughout his career, Akifumi Ooshima has worked with prominent companies, including Sony Corporation. His experience in the industry has allowed him to develop innovative solutions that enhance the quality and efficiency of polysilicon film evaluation.

Collaborations

Ooshima has collaborated with notable colleagues such as Hiroyuki Wada and Koichi Tatsuki. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Akifumi Ooshima's contributions to polysilicon technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the semiconductor industry positively.