The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Mar. 24, 2003
Hiroyuki Wada, Kanagawa, JP;
Yoshimi Hirata, Kanagawa, JP;
Ayumu Taguchi, Tokyo, JP;
Koichi Tatsuki, Kanagawa, JP;
Nobuhiko Umezu, Kanagawa, JP;
Shigeo Kubota, Kanagawa, JP;
Tetsuo Abe, Kanagawa, JP;
Akifumi Ooshima, Kanagawa, JP;
Tadashi Hattori, Kanagawa, JP;
Makoto Takatoku, Kanagawa, JP;
Yukiyasu Sugano, Kanagawa, JP;
Hiroyuki Wada, Kanagawa, JP;
Yoshimi Hirata, Kanagawa, JP;
Ayumu Taguchi, Tokyo, JP;
Koichi Tatsuki, Kanagawa, JP;
Nobuhiko Umezu, Kanagawa, JP;
Shigeo Kubota, Kanagawa, JP;
Tetsuo Abe, Kanagawa, JP;
Akifumi Ooshima, Kanagawa, JP;
Tadashi Hattori, Kanagawa, JP;
Makoto Takatoku, Kanagawa, JP;
Yukiyasu Sugano, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
The state of a polysilicon film formed by excimer laser annealing an amorphous silicon film is to be evaluated. When the amorphous silicon film is annealed to form a polysilicon film, linearity or periodicity presents itself in the spatial structure of the film surface of the polysilicon film formed depending on the energy applied to the amorphous silicon during annealing. This linearity or periodicity is processed as an image and represented numerically from the image by exploiting the linearity or periodicity. The state of the polysilicon film is checked based on the numerical results.