Hyogo, Japan

Akemi Teratani

This inventor holds 3 USPTO granted patents. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 2001-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akemi Teratani. Retrieved from https://idiyas.com/inventor/akemi-teratani

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.8

ph-index = 3

Forward Citations = 36(Granted Patents)


Location History:

  • Hyogo, JP (2001 - 2002)
  • Tokyo, JP (2002)

Company Filing History:


Years Active: 2001-2002

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3 patents (USPTO):Explore Patents

Title: Akemi Teratani: Innovator in Semiconductor Technology

Introduction

Akemi Teratani is a prominent inventor based in Hyogo, Japan. She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her innovative work focuses on improving the manufacturing processes and structures of semiconductor devices.

Latest Patents

One of her latest patents is titled "Semiconductor device and manufacturing method thereof." This invention involves the formation of a silicon oxide film that covers a polysilicon plug. A bowing shaped hole is created, and a barrier metal along with a metal film is formed, which undergoes prescribed anisotropic etching. This method addresses the RIE-lag effect, ensuring that the etch rate of the barrier metal is controlled, thus preventing the exposure of the polysilicon plug's surface. This results in a semiconductor device that guarantees a reliable electrical connection of metal interconnections.

Another notable patent is "Semiconductor device having an improved contact structure and a manufacturing method thereof." This invention describes a method for forming a contact hole without damaging the etching stopper film or degrading electric characteristics. This is achieved through a self-alignment method, where an interlayer oxide film is etched using plasma etching with a specific gas mixture. This innovative approach allows for the tapering of the shoulder of the silicon nitride film, enhancing the overall performance of the semiconductor device.

Career Highlights

Akemi Teratani is currently employed at Mitsubishi Electric Corporation, where she continues to push the boundaries of semiconductor technology. Her work has been instrumental in developing advanced manufacturing techniques that improve device performance and reliability.

Collaborations

Throughout her career, Akemi has collaborated with notable colleagues such as Shigenori Sakamori and Kazuyuki Ohmi. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Akemi Teratani is a trailblazer in the semiconductor industry, with a focus on enhancing manufacturing processes and device structures. Her contributions have significantly impacted the field, and her ongoing work promises to lead to further advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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