Garland, TX, United States of America

Ajay Tapiawala

This inventor holds 2 USPTO granted patents. Top assignee: Ball Semiconductor Corporation. Active years: 2000-2001.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 24(Granted Patents)


Location History:

  • Dallas, TX (US) (2000)
  • Garland, TX (US) (2001)

Company Filing History:


Years Active: 2000-2001

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2 patents (USPTO):Explore Patents

Title: Innovations by Ajay Tapiawala in Chemical Vapor Deposition

Introduction

Ajay Tapiawala is a notable inventor based in Garland, TX (US), recognized for his contributions to the field of chemical vapor deposition. With a total of two patents to his name, he has developed innovative methods that enhance the deposition of metals on spherical semiconductor substrates.

Latest Patents

One of his latest patents is titled "Chemical vapor deposition of metals on a spherical shaped semiconductor substrate." This patent discloses a method and system for chemical vapor deposition (MO CVD) of a metal layer upon a spherical substrate at atmospheric pressure. The method involves using a reactor made of quartz, where the semiconductor spherical substrate is heated by an infrared heater. This heater operates at a wavelength between 1 and 3 microns, allowing for effective absorption by the substrate while being transmitted by the quartz.

Another significant patent is "Method and apparatus for blanket aluminum CVD on spherical integrated." This invention outlines a method and apparatus for metal-organics chemical vapor deposition (MO CVD) of a metal layer on a spherical substrate. The process includes pretreating the substrate with a vapor of a first precursor before exposing it to a thermally dissociated precursor of metal. This ensures a uniformly deposited metal layer coverage over the substrate, which is then annealed and cooled.

Career Highlights

Ajay Tapiawala is currently employed at Ball Semiconductor Corporation, where he continues to innovate in the field of semiconductor technology. His work focuses on improving deposition techniques that are crucial for the advancement of semiconductor applications.

Collaborations

Throughout his career, Ajay has collaborated with notable colleagues such as Ivan Herman Murzin and Jeffrey Ned Miller. These collaborations have contributed to the development of his innovative patents and advancements in the field.

Conclusion

Ajay Tapiawala's contributions to chemical vapor deposition technology demonstrate his commitment to innovation in the semiconductor industry. His patents reflect significant advancements that could influence future developments in this field.

Profile summary based on public USPTO records.
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