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Years Active: 2014-2015
Title: Aileen Li: Innovator in Semiconductor Technology
Introduction
Aileen Li is a prominent inventor based in Shanghai, China, known for her significant contributions to semiconductor technology. With a total of four patents to her name, she has made remarkable advancements in the field, particularly in the development of high-K dielectric layer-based semiconductor structures.
Latest Patents
Aileen Li's latest patents include a method for fabricating semiconductor structures that involves providing a semiconductor substrate and forming a high-K dielectric layer. This innovative method includes a first thermal annealing process to remove the first dielectric layer, allowing the high-K dielectric layer to be positioned directly on the semiconductor substrate. Additionally, her work on transistor devices outlines a method for forming transistors that reduces negative bias temperature instability through the fluorination of high-K dielectric layers.
Career Highlights
Throughout her career, Aileen Li has worked with notable companies such as Semiconductor Manufacturing International Corporation and Semiconductor Manufacturing International (Shanghai) Corporation. Her expertise in semiconductor fabrication processes has positioned her as a key player in the industry.
Collaborations
Aileen has collaborated with esteemed colleagues, including Jinghua Ni and David Han, contributing to various projects that enhance semiconductor technology.
Conclusion
Aileen Li's innovative work in semiconductor technology and her impressive patent portfolio highlight her as a leading figure in the field. Her contributions continue to influence advancements in semiconductor fabrication processes.