This inventor holds 2 USPTO granted patents. Top assignees: Chartered Semiconductor Manufacturing Ltd (Corporation), Shimano (Singapore) Private Limited. Active years: 2001-2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001-2010
Title: Aik Kwang Ng: Innovator in Bicycle Components and Plasma Etching Technology
Introduction
Aik Kwang Ng is a notable inventor based in Singapore, recognized for his contributions to bicycle component design and plasma etching processes. With a total of 2 patents, Ng has made significant strides in enhancing the functionality and efficiency of these technologies.
Latest Patents
Ng's latest patents include a bicycle component mounting structure and a method for single wafer in-situ dry cleaning and seasoning for plasma etching processes. The bicycle component mounting structure features a band and a band tightener designed to securely attach components to a bicycle frame. This innovative design ensures that the band tightener maintains contact with the frame, providing stability and reliability. The second patent introduces a new method for cleaning and seasoning a Plasma Etch chamber. This process involves inserting a wafer into the chamber, performing a plasma clean, and then seasoning the chamber before etching the wafer. This cycle enhances the efficiency of the plasma etching process.
Career Highlights
Throughout his career, Aik Kwang Ng has worked with prominent companies such as Chartered Semiconductor Manufacturing Ltd and Shimano (Singapore) Private Limited. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.
Collaborations
Ng has collaborated with talented individuals in his field, including Dai Xuechun and Liang Chen. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.
Conclusion
Aik Kwang Ng's work exemplifies the spirit of innovation in the fields of bicycle components and plasma etching technology. His patents reflect a commitment to improving existing technologies and enhancing their applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile