Suita, Japan

Ai Isohashi



Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Ai Isohashi in Semiconductor Processing

Introduction: Ai Isohashi, an accomplished inventor based in Suita, Japan, has made significant strides in the field of semiconductor processing. With a focus on environmentally friendly methods, she has achieved a noteworthy patent that reflects her ingenuity and commitment to advancing technology.

Latest Patents: Ai Isohashi holds a patent for a "Method for processing wide-bandgap semiconductor substrate and apparatus therefor." This innovative technique utilizes no abrasives or solutions with high environmental impact, allowing for efficient processing of single crystal materials such as Silicon Carbide (SiC), Gallium Nitride (GaN), Aluminum Gallium Nitride (AlGaN), and Aluminum Nitride (AlN). The method offers various processing speeds and achieves a surface quality superior to that produced by conventional Chemical Mechanical Polishing (CMP). It also demonstrates excellent compatibility with clean room environments, promoting a sustainable approach to semiconductor fabrication.

Career Highlights: Isohashi's professional journey includes valuable experiences at notable institutions. She has contributed to the academic community at Osaka University, where pioneering research and innovation are at the forefront. In addition, her tenure at Toho Engineering Co., Ltd. allowed her to apply her expertise in a practical setting, further enhancing her capabilities as an inventor.

Collaborations: Throughout her career, Ai Isohashi has collaborated with esteemed coworkers, including Kazuto Yamauchi and Yasuhisa Sano. These collaborations have fostered an environment of shared knowledge and innovation, leading to advancements in semiconductor technologies and processing methods.

Conclusion: Ai Isohashi stands out as a prominent figure in the field of semiconductor processing with her groundbreaking patent and collaborative spirit. Her work reflects a dedication to creating sustainable and high-quality manufacturing processes. As the semiconductor industry continues to evolve, innovators like Ai Isohashi will play a vital role in shaping its future.

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