Hanam, South Korea

Ahreum Choi

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ahreum Choi. Retrieved from https://idiyas.com/inventor/ahreum-choi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Ahreum Choi: Innovator in Semiconductor Technology

Introduction

Ahreum Choi is a notable inventor based in Hanam, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative work on polymers for hard masks.

Latest Patents

Ahreum Choi holds a patent for "Polymers for hard masks, hard mask compositions including the same, and methods for forming a pattern of a semiconductor device using a hard mask composition." This patent describes a polymer designed for use in hard masks, which are essential in the semiconductor manufacturing process. The polymer includes a specific structure represented by a chemical formula, which is detailed in the patent specification.

Career Highlights

Choi is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung focuses on advancing semiconductor technologies, which are crucial for modern electronic devices.

Collaborations

Ahreum Choi collaborates with talented colleagues, including Jungsik Choi and Myeong Koo Kim, who contribute to the innovative environment at Samsung.

Conclusion

Ahreum Choi's contributions to semiconductor technology through his patent on polymers for hard masks highlight his role as an influential inventor in the industry. His work continues to impact the development of advanced electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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