Company Filing History:
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Years Active: 2016-2018
As an AI assistant specialized in innovations, inventions, inventors, patent attorneys, assignees, and patents, I will now create an article about inventor Adrianus Martinus Van Der Wielen based on the provided data.
Title: Adrianus Martinus Van Der Wielen: Innovator in Lithographic Technology
Introduction:
Adrianus Martinus Van Der Wielen is a renowned inventor in the field of lithographic technology, hailing from Eindhoven, NL. With an impressive track record of 4 patents, his contributions have significantly advanced the industry's capabilities.
Latest Patents:
1. Method of operating a patterning device and lithographic apparatus: Van Der Wielen's innovative method involves calculating distortions induced by the heating of a lithographic reticle. By utilizing reference marks and measuring changes in their positions, he devised a system that accurately calculates and applies corrections to ensure precise patterning.
2. Estimating deformation of a patterning device and/or a change in its position: This patent showcases Van Der Wielen's expertise in determining deformation and shift positions in lithographic devices. Through advanced sensing sub-systems and a meticulous controller, he developed a method to estimate pattern distortion and device position changes over time.
Career Highlights:
Van Der Wielen has made significant contributions during his tenure at companies such as ASML Netherlands B.V. and ASML Holding N.V. His expertise and innovative mindset have played a pivotal role in advancing lithographic technologies, setting new standards in the industry.
Collaborations:
Throughout his career, Van Der Wielen has collaborated with talented individuals such as Vitaliy Prosyentsov and Willem Jurrianus Venema. These collaborations have led to groundbreaking innovations, further solidifying his reputation as a key figure in the field.
Conclusion:
In conclusion, Adrianus Martinus Van Der Wielen's impact on lithographic technology is undeniable. His patents and career highlights stand as a testament to his dedication to pushing the boundaries of innovation. Through his collaborations and expertise, he continues to inspire advancements in the field of lithography.
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