Company Filing History:
Years Active: 2024-2025
Title: Adriana Vintila: Innovator in Substrate Processing Technology
Introduction
Adriana Vintila is a prominent inventor based in Wilsonville, OR (US). She has made significant contributions to the field of substrate processing technology, holding a total of 4 patents. Her innovative work has advanced the capabilities of plasma processing chambers and indexing apparatuses.
Latest Patents
One of her latest patents is the "Bidirectional indexing apparatus." This invention features a plurality of bidirectional indexing heads that can operate independently or in concert to adjust the gap between a substrate and a pedestal in a substrate processing chamber. The design includes a base and a rotatable plate with profiled pockets that define camming surfaces. Camming pins act on these surfaces to move the rotatable plate in either direction when actuated. Another notable patent is "Spatially tunable deposition to compensate within wafer differential bow." This invention involves a plasma processing chamber designed for depositing films on the underside surface of a wafer, featuring a showerhead pedestal with distinct zones for depositing different films.
Career Highlights
Adriana Vintila is currently employed at Lam Research Corporation, where she continues to innovate in the field of semiconductor manufacturing. Her work has been instrumental in enhancing the efficiency and effectiveness of substrate processing technologies.
Collaborations
Throughout her career, Adriana has collaborated with talented individuals such as Matthew Mudrow and Fayaz A Shaikh. These collaborations have fostered a creative environment that has led to groundbreaking advancements in their field.
Conclusion
Adriana Vintila's contributions to substrate processing technology exemplify her innovative spirit and dedication to advancing the industry. Her patents reflect her expertise and commitment to improving semiconductor manufacturing processes.