This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Adriaan Marinus Lankhorst: Innovator in Reactive Ion Etching Technology
Introduction
Adriaan Marinus Lankhorst is a notable inventor located in Oirschot, Netherlands. He is recognized for his contributions to the field of plasma processing, specifically through his patent related to reactive ion etching technology. With one significant patent to his name, Lankhorst has made strides in improving substrate processing techniques.
Latest Patents
Lankhorst's patent, titled "Apparatus and method for reactive ion etching," presents an innovative approach to fabricating microelectronics. The invention encompasses an apparatus designed for reactive ion etching of a substrate, consisting of several crucial components. It features a plasma etch zone with an etch gas supply and a plasma generating structure that ignites plasma. This system effectively accelerates etch plasma towards the substrate, ensuring ions can impinge on the surface. Additionally, the invention includes a passivation zone with a specialized cavity and gas supply, which aids in the smooth operational transition during the etching process. The integration of a gas purge structure enhances efficacy by providing a spatial division between the etch and passivation zones, ensuring a controlled environment for processing.
Career Highlights
Adriaan Marinus Lankhorst is affiliated with the Dutch Research Organization, known as the Netherlands Organization for Applied Scientific Research (TNO). Through his work, he has engaged in advancing technologies that play a significant role in various scientific and industrial applications.
Collaborations
Throughout his career, Lankhorst has collaborated with distinguished colleagues like Freddy Roozeboom and Paulus Willibrordus George Poodt. These partnerships have likely contributed to the innovative solutions and advancements in the field of reactive ion etching.
Conclusion
Adriaan Marinus Lankhorst stands as a figure of innovation within the plasma processing arena. His patented invention highlights his dedication to improving technology that is prevalent in modern electronics manufacturing. As research continues to evolve, contributions such as Lankhorst's will remain fundamental to the advancement of various industries and technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile