Company Filing History:
Years Active: 1983-1989
Title: The Innovations of Adolf Scheibe
Introduction
Adolf Scheibe is a notable inventor based in Ottobrunn, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the development of large-scale integrated circuits. With a total of 4 patents to his name, Scheibe's work has had a lasting impact on the industry.
Latest Patents
One of Scheibe's latest patents is a method of producing a large-scale integrated MOS field-effect transistor. This innovative method involves forming p and n-doped troughs in a silicon substrate to accommodate respective n and p-channel transistors. The process includes introducing appropriate dopant atoms into the troughs through repeated ion implantations to adjust various transistor cutoff voltages. Additionally, it incorporates masking techniques using photo resist structures and silicon oxide and silicon nitride structures. Another significant patent is for manufacturing VLSI complementary MOS field effect transistor circuits. This method utilizes silicon gate technology and allows for the simultaneous production of switched capacitor structures, enhancing the efficiency of VLSI CMOS circuits.
Career Highlights
Scheibe has spent a considerable part of his career at Siemens Aktiengesellschaft, where he has been able to apply his innovative ideas in a practical setting. His work has contributed to advancements in semiconductor technology, making him a respected figure in the field.
Collaborations
Throughout his career, Scheibe has collaborated with notable colleagues such as Ulrich Schwabe and Erwin P Jacobs. These collaborations have further enriched his work and contributed to the success of various projects.
Conclusion
Adolf Scheibe's contributions to semiconductor technology through his patents and work at Siemens Aktiengesellschaft highlight his importance as an inventor. His innovative methods continue to influence the development of integrated circuits and semiconductor devices.