Rodenbach, Germany

Adolf Langer

This inventor holds 1 USPTO granted patent. Top assignee: Demetron Gesellschaft Fuer Elektronik-Werkstoffe M.b.h.. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Adolf Langer. Retrieved from https://idiyas.com/inventor/adolf-langer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: The Innovations of Adolf Langer

Introduction

Adolf Langer is a notable inventor based in Rodenbach, Germany. He has made significant contributions to the field of electronics and materials science. His work primarily focuses on developing advanced materials for optical applications.

Latest Patents

Langer holds a patent for a sputtering target designed for producing optically transparent layers. The patent, titled "Sputtering target for producing optically transparent layers and method," involves sputter targets made of bismuth with 0.2 to 10% by weight manganese. This innovative approach enhances the resistance to UV light in silver layers when manganese is present in the form of the intermetallic compound BiMn, evenly dispersed within the metallic bismuth matrix.

Career Highlights

Langer is associated with Demetron Gesellschaft für Elektronik-Werkstoffe M.b.H., where he applies his expertise in material science. His work has led to advancements in the production of surface layers that reflect heat, particularly in glass and plastic applications.

Collaborations

Throughout his career, Langer has collaborated with esteemed colleagues such as Guenther Schlamp and Klaus P. Gall. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in their field.

Conclusion

Adolf Langer's contributions to the field of electronics and materials science are noteworthy. His innovative patent for sputtering targets demonstrates his commitment to advancing technology. His collaborations and career achievements further highlight his impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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