The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 1990
Filed:
May. 19, 1988
Applicant:
Inventors:
Guenther Schlamp, Steinbach, DE;
Klaus P Gall, Rodenbach, DE;
Adolf Langer, Rodenbach, DE;
Georg Ptaschek, Rosbach, DE;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C03C / ;
U.S. Cl.
CPC ...
20429813 ; 75228 ; 20419227 ; 419 38 ; 419 41 ;
Abstract
Sputter targets of bismuth with 0.2 to 10% by weight manganese for producing optically transparent surface layers which reflect heat in combination with silver layers on panes of glass and of plastic achieve an improved resistance to UV in silver layers if the manganese is present in the form of the intermetallic compound BiMn in an even, finely dispersed distribution within the metallic bismuth matrix.