Steinbach, Germany

Guenther Schlamp


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Guenther Schlamp: Innovator in Sputtering Technology

Introduction

Guenther Schlamp is a notable inventor based in Steinbach, Germany. He has made significant contributions to the field of electronics and materials science, particularly in the development of sputtering targets for optically transparent layers.

Latest Patents

Schlamp holds a patent for a sputtering target designed for producing optically transparent layers. This innovative patent involves sputter targets made of bismuth with 0.2 to 10% by weight manganese. The technology aims to create surface layers that reflect heat while improving UV resistance in silver layers when manganese is present in the form of the intermetallic compound BiMn. This compound is evenly and finely dispersed within the metallic bismuth matrix, enhancing the performance of the layers on glass and plastic panes.

Career Highlights

Guenther Schlamp is associated with Demetron Gesellschaft für Elektronik-Werkstoffe M.b.H., where he has contributed to advancing electronic materials. His work has been pivotal in developing technologies that improve the durability and functionality of electronic components.

Collaborations

Some of his notable coworkers include Klaus P. Gall and Adolf Langer, who have collaborated with him on various projects within the field of electronics and materials science.

Conclusion

Guenther Schlamp's innovative work in sputtering technology has made a significant impact on the production of optically transparent layers. His contributions continue to influence advancements in electronic materials and applications.

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