Albuquerque, NM, United States of America

Adam Wu

This inventor holds 1 USPTO granted patent. Top assignee: The University of New Mexico. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Adam Wu. Retrieved from https://idiyas.com/inventor/adam-wu-6imzn2pg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: The Innovations of Adam Wu

Introduction

Adam Wu is an accomplished inventor based in Albuquerque, NM (US). He has made significant contributions to the field of nonlinear optics. His innovative work has led to the development of a unique method for creating large second-order nonlinearities in optical materials.

Latest Patents

Adam Wu holds a patent for a method and apparatus for creating large second-order nonlinearities. This patent describes a process where a large second-order nonlinearity is induced in the near surface region of commercial fused silica optical flats. The process involves a temperature range of 250°C to 325°C and an electric field of approximately 5 x 10^4 V/cm. The resulting nonlinearity is significantly larger than that found in fiber second-harmonic experiments and remains stable at room temperature. The nonlinearity can be cycled through repeated depoling and repoling processes.

Career Highlights

Adam Wu is affiliated with the University of New Mexico, where he continues to advance his research in nonlinear optics. His work has garnered attention for its potential applications in various optical technologies.

Collaborations

He has collaborated with notable colleagues, including Richard A. Myers and Anadi Mukerjee, contributing to a dynamic research environment.

Conclusion

Adam Wu's innovative contributions to nonlinear optics exemplify the impact of dedicated research and collaboration in advancing technology. His patent reflects a significant achievement in the field, showcasing the potential for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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