The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 1993
Filed:
Sep. 27, 1991
S R Brueck, Albuquerque, NM (US);
Richard A Myers, Albuquerque, NM (US);
Anadi Mukerjee, Albuquerque, NM (US);
Adam Wu, Albuquerque, NM (US);
University of New Mexico, Albuquerque, NM (US);
Abstract
A large second-order nonlinearity (.chi..sup.(2) .about.1 pm/V.about.0.2 .chi..sup.(2).sub.22 of LiNbO.sub.3) is induced in the near surface (.about.4 .mu.m) region of commercial fused silica optical flats by a temperature (250.degree.-325.degree. C.) and electric field (E.about.5.times.10.sup.4 V/cm) poling process. Once formed, the nonlinearity is roughly 10.sup.3 -10.sup.4 larger than that found in fiber second-harmonic experiments and is very stable at room temperature and laboratory ambient. The nonlinearity can be cycled by repeated depoling (temperature only) and repoling (temperature and electric field) processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile