Csetény, Hungary

Adam Varga

This inventor holds 1 USPTO granted patent. Top assignee: Arcsecond, Inc.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Adam Varga. Retrieved from https://idiyas.com/inventor/adam-varga-l1yn4pia

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Adam Varga - Innovator in Form Analysis Technology

Introduction

Adam Varga is a notable inventor based in Csetény, Hungary. He has made significant contributions to the field of form analysis technology, particularly through his innovative patent. His work focuses on methods and systems for monitoring and measuring form, which have practical applications in various industries.

Latest Patents

Adam Varga holds a patent for a form analysis system. This system includes a flexible garment equipped with a sensor array that features two or more sensors strategically positioned to align with the body parts of the wearer. The design incorporates a harness coupled to the sensor array, which contains stretchable wiring for transmitting signals generated by the sensors. Additionally, a hub is connected to the harness, designed to receive signals from the sensor array and transmit them to a base station.

Career Highlights

Adam Varga is currently associated with Arcsecond, Inc., where he continues to develop and refine his innovative technologies. His work has garnered attention for its potential to enhance the accuracy and efficiency of form analysis in various applications.

Collaborations

Throughout his career, Adam has collaborated with talented individuals such as Vaidyanathan P Ramasarma and Jozsef Petenyi. These collaborations have contributed to the advancement of his projects and the successful implementation of his inventions.

Conclusion

Adam Varga is a pioneering inventor whose work in form analysis technology is shaping the future of monitoring and measuring systems. His innovative patent and contributions to Arcsecond, Inc. highlight his commitment to advancing technology in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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