Fremont, CA, United States of America

Adam Patrick Bateman

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Lam Research Corporation. Active years: 2021-2024.

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2021-2024

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2 patents (USPTO):Explore Patents

Title: Adam Patrick Bateman: Innovator in Substrate Processing Systems

Introduction

Adam Patrick Bateman is a notable inventor based in Fremont, CA. He has made significant contributions to the field of substrate processing systems, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

One of his latest patents is titled "Autoclean for load locks in substrate processing systems." This invention outlines a method for cleaning a load lock by utilizing gas to disturb particles from surfaces, followed by a flushing process to remove the gas and particles effectively. Another significant patent is the "Halogen removal module and associated systems and methods." This patent describes a chamber designed to enclose a processing region, featuring a substrate support structure, gas inputs and outputs, humidity control, and temperature regulation to enhance processing efficiency.

Career Highlights

Adam works at Lam Research Corporation, a leading company in the semiconductor equipment industry. His role involves developing advanced technologies that improve substrate processing, which is crucial for the manufacturing of semiconductor devices.

Collaborations

Throughout his career, Adam has collaborated with talented individuals such as Travis R. Taylor and Todd Anthony Lopes. These collaborations have contributed to the advancement of innovative solutions in the field.

Conclusion

Adam Patrick Bateman is a distinguished inventor whose work in substrate processing systems has led to valuable patents and advancements in technology. His contributions continue to influence the semiconductor industry positively.

Profile summary based on public USPTO records.
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