Santa Clara, CA, United States of America

Abinash Tripathy

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Abinash Tripathy. Retrieved from https://idiyas.com/inventor/abinash-tripathy-tza4uko1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Abinash Tripathy: Innovator in Seam-Free Gapfill Technology

Introduction

Abinash Tripathy is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of materials science, particularly in the development of advanced gapfill technologies. His innovative approach has led to the creation of a patented method that enhances the efficiency of semiconductor manufacturing processes.

Latest Patents

Abinash Tripathy holds a patent for "Seam Free Titanium Nitride Gapfill." This invention relates to methods of depositing seam-free gapfill, which consists of titanium nitride. The gapfill methods involve forming a first layer without treatment or densification, followed by a second layer that undergoes periodic treatment. The resulting gapfill is advantageously seam-free, which is a significant improvement in the manufacturing process.

Career Highlights

Abinash Tripathy is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display manufacturing industries. His work at Applied Materials has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in technology.

Collaborations

Throughout his career, Abinash has collaborated with talented individuals such as Radhika P Patil and Tatsuya E Sato. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Abinash Tripathy's contributions to the field of semiconductor manufacturing through his patented seam-free gapfill technology exemplify his innovative spirit. His work continues to influence advancements in materials science and manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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