Thane, India

Abhishek Mandal

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Abhishek Mandal. Retrieved from https://idiyas.com/inventor/abhishek-mandal-mdpm3zit

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Abhishek Mandal: Innovator in Semiconductor Processing

Introduction

Abhishek Mandal is a notable inventor based in Thane, India. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent. His work focuses on improving the efficiency and effectiveness of semiconductor cleaning methods.

Latest Patents

Abhishek Mandal holds a patent for "Semiconductor cleaning using plasma-free precursors." This exemplary semiconductor processing method involves providing one or more deposition precursors to a semiconductor processing chamber. A substrate is disposed within a processing region of the chamber, where a silicon-containing material is deposited on the substrate and on various components of the chamber. The method includes the use of a fluorine-containing precursor that is plasma-free when introduced to the processing region. This innovative approach allows for the effective removal of silicon-containing material from the components of the semiconductor processing chamber.

Career Highlights

Abhishek Mandal is currently associated with Applied Materials, Inc., a leading company in the semiconductor industry. His role at the company allows him to further develop and implement his innovative ideas in semiconductor processing. His expertise and contributions have positioned him as a valuable asset in the field.

Collaborations

Due to space constraints, the collaborations section has been omitted.

Conclusion

Abhishek Mandal's work in semiconductor processing exemplifies the innovative spirit of modern inventors. His patent for plasma-free cleaning methods showcases his commitment to advancing technology in the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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