Abhijit Pethe

Title: Abhijit Pethe: Innovator in Semiconductor Technology

Introduction

Abhijit Pethe is a notable inventor based in San Jose, CA, specializing in semiconductor technology. He has made significant contributions to the field, holding 2 patents that address critical challenges in semiconductor manufacturing.

Latest Patents

His latest patents include innovative methods for reducing native oxides in semiconductor materials. One patent focuses on the reduction of native oxides by annealing in reducing gas or plasma. This invention addresses the issue of native oxide growth on germanium, silicon germanium, and InGaAs, which adversely affects the capacitive equivalent thickness (CET) and effective oxide thickness (EOT) of high-k and low-k metal-oxide layers. The method involves exposing the substrate to a gas or plasma reductant, such as hydrogen, which diffuses through permeable layers to react with and eliminate the re-grown native oxide.

Another patent details the process of oxide removal by remote plasma treatment using fluorine and oxygen radicals. This technique effectively etches oxides from underlying silicon while preventing pitting that can occur when bare silicon is exposed. The process ensures a highly uniform passivation layer remains on the silicon, which can either be retained or removed, depending on the desired outcome.

Career Highlights

Abhijit Pethe is currently employed at Intermolecular, Inc., where he continues to advance semiconductor technologies. His work has been instrumental in developing methods that enhance the performance and reliability of semiconductor devices.

Collaborations

Throughout his career, Abhijit has collaborated with esteemed colleagues, including J Watanabe and Jingang Su. These partnerships have fostered innovation and contributed to the success of various projects within the semiconductor industry.

Conclusion

Abhijit Pethe's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes.