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Title: Abhijeet Patra: Innovator in Inorganic Metal Oxides and Memory Devices
Introduction
Abhijeet Patra is a notable inventor based in Singapore, recognized for his contributions to the fields of materials science and memory devices. With a total of 2 patents, he has made significant strides in developing innovative materials that have practical applications in medical and technological fields.
Latest Patents
His latest patents include "Thin film deposited inorganic metal oxide as a selective substrate for mammalian cell culture and as an implant coating." This invention discloses a material that may be useful as a coating for optical slides and medical implants. The material aids or restricts the growth of cells on a coating of the composite material. The composite material features a substrate on which a coating layer of an amorphous metal oxide is formed. The metal oxide may include one or more of AgO, ZnO, ZrO, TiO, CuO, and YO, with the coating layer ranging from 5 to 100 nm thick and a root mean square roughness of the coating surface between 0.1 to 0.7 nm.
Another significant patent is "Resistive memory devices based on metal coordinated redox active ligands." This invention discloses a compound that can be used in the formation of a resistive memory device. The patent also outlines methods for manufacturing such devices and their various uses.
Career Highlights
Abhijeet has worked with prestigious institutions such as the National University of Singapore and the Agency for Science, Technology and Research. His work at these organizations has allowed him to explore and develop innovative solutions in his field.
Collaborations
Throughout his career, Abhijeet has collaborated with talented individuals, including Michal Marcin Dykas and Kingshuk Poddar. These collaborations have contributed to the advancement of his research and inventions.
Conclusion
Abhijeet Patra's innovative work in inorganic metal oxides and memory devices showcases his commitment to advancing technology and improving medical applications. His contributions are significant in shaping the future of these fields.
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