Agency for Science, Technology and Research

National University of Singapore

Azometrix

Abhijeet Patra

Ee Jen Wilson Wang

Thirumalai Venky Venkatesan

Viknish Krishnan Kutty

Mei Bigliardi

Paul Lorenz Bigliardi

Michal Marcin Dykas

Sreetosh Goswami

Xuefeng Hu

Venkatesan Thirumalai

Sreebrata Goswami

Kingshuk Poddar

Disclosed herein is a material that may be useful as a coating for optical slides and medical implants. The material may aid or restrict grown of cells on a coating of the composite material. As such, there is provided a composite material having a substrate on the surface of which a coating layer of an amorphous metal oxide is formed. The metal oxide may be one or more of AgO, ZnO, ZrO, TiO, CuO, and YOand the coating layer may be from 5 to 100 nm thick and have a root mean square roughness of the coating surface is from 0.1 to 0.7 nm.

Thin film deposited inorganic metal oxide as a selective substrate for mammalian cell culture and as an implant coating

Disclosed herein is a compound of formula (I):[M(L)](A)&#x2003;&#x2003;(I) where A, M, L, n, m, y and z are as defined herein, which can be used in the formation of a resistive memory device. Also disclosed herein are methods of manufacturing such devices and their uses.

Resistive memory devices based on metal coordinated redox active ligands

Growing community of inventors

Singapore, Singapore

Abhijeet Patra