Temple Terrace, FL, United States of America

Abdu Rub Abdur

This inventor holds 1 USPTO granted patent. Top assignee: University of South Florida. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Abdu Rub Abdur. Retrieved from https://idiyas.com/inventor/abdu-rub-abdur

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Abdu Rub Abdur: Innovator in Wet Etching Processes

Introduction

Abdu Rub Abdur is a notable inventor based in Temple Terrace, FL (US). He has made significant contributions to the field of silicon etching, particularly through his innovative techniques that enhance the efficiency and effectiveness of MEMS processing.

Latest Patents

Abdur holds a patent for a wet etching process that illustrates a bulk silicon etching technique. This method yields straight sidewalls and through-wafer structures in very short times using standard silicon wet etching techniques. The invention employs selective porous silicon formation and dissolution to create high aspect ratio structures with straight sidewalls, which is crucial for through-wafer MEMS processing. He has 1 patent to his name.

Career Highlights

Abdur is affiliated with the University of South Florida, where he continues to advance research in silicon etching and MEMS technologies. His work has garnered attention for its practical applications in various technological fields.

Collaborations

Some of his notable coworkers include Shekhar Bhansali and Sunny Kedia, who have collaborated with him on various projects related to silicon etching and MEMS processing.

Conclusion

Abdu Rub Abdur's contributions to the field of wet etching processes demonstrate his innovative spirit and commitment to advancing technology. His work at the University of South Florida continues to influence the development of efficient MEMS processing techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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