Aaron Eppler

Title: The Innovative Contributions of Aaron Eppler

Introduction

Aaron Eppler is a notable inventor based in Los Gatos, California. He has made significant contributions to the field of semiconductor processing. His work focuses on enhancing the efficiency and effectiveness of plasma etching methods.

Latest Patents

Aaron Eppler holds a patent for "Sidewall passivation for plasma etching." This innovative patent describes exemplary semiconductor processing methods that include depositing a boron-containing material on the substrate. The boron-containing material extends along the sidewalls of the features in the substrate. The methods also involve forming a plasma of an oxygen-containing precursor and contacting the substrate with plasma effluents of the oxygen-containing precursor. This process etches a portion of the features in the substrate and oxidizes the boron-containing material.

Career Highlights

Aaron Eppler is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to contribute to advancements in semiconductor technology. He has a strong focus on improving processing methods that are crucial for the development of modern electronic devices.

Collaborations

Aaron has collaborated with talented coworkers, including Zhonghua Yao and Qian Fu. Their combined expertise has fostered an environment of innovation and creativity within their projects.

Conclusion

Aaron Eppler's contributions to semiconductor processing through his patent and work at Applied Materials, Inc. highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of technology.